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BOC216
Issue Date:16th August 2005

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Click here for full text in CHINESE | GERMAN | ITALIAN | SPANISH

CLICK HERE for 300dpi RGB hi-res image
To download image to computer:
PC 'right-click', choose 'Save Pictures As'; MAC 'click and hold', choose 'Download Image to Disk'.

New vacuum coating system offers increased productivity and flexibility for thin film deposition processes

.BOC Edwards has introduced a new addition to its range of vacuum coating systems for thin film deposition processes. The TF600 combines a 600mm wide coating chamber with a high throughput, vacuum pumping system. The new system is designed to deliver increased productivity and flexibility for those responsible for the research, development and production of substrates used in the semiconductor, laser and scientific industries.

The TF600 has several new design features such as the placement of the high vacuum pumping system at the rear of the chamber, to provide faster pumpdown. Pumping system options include diffusion, turbomolecular, and cryogenic high vacuum pumps, and the XDS 35i ‘dry’ scroll pump for backing and chamber roughing.

Every TF600 system is custom built to the user’s specific requirements. Process options include resistance evaporation, electron beam, RF, DC and pulsed DC sputtering. With a variety of chamber heights, loadlock options and multiple source configurations, the TF600 allows users to address a wide range of applications and specialist techniques such as lift off and ion beam processing.

The TF600 joins BOC Edwards’ range of highly successful thin film systems, which include Temescal electron beam systems. Also available is the entry level Auto 306 evaporator and the versatile Auto 500, which offer additional chamber and deposition options.

For further information contact
Andrew Davis, BOC Edwards. Manor Royal, Crawley, RH10 9LW
Tel: 01293 603134 Fax: 01293 534149
email: andrewdavis@edwards.boc.com
Website: http://www.edwards.boc.com

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